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Patent Searching and Data


Title:
SUBSTRATE TREATING SYSTEM
Document Type and Number:
Japanese Patent JPH0766105
Kind Code:
A
Abstract:

PURPOSE: To allow cleaning on the rear of a substrate while suction holding by providing a substrate holding part with an opening on the outside of the substrate sucking part thereof in the radial direction and providing a cleaning liquid ejecting part below the opening.

CONSTITUTION: A disk-like substrate holding surface 4 is provided above a substrate holding part. The substrate holding surface 4 has diameter longer than the diagonal of a rectangular substrate W with a disk-like suction part 10 and a ring-like peripheral part 11 being disposed, respectively, in the center and around the suction part 10. A large number of cleaning holes 14, 15 are disposed concentrically in two rows on the inside of the peripheral part 11 wherein the cleaning holes 14 are located closer to the center than the cleaning holes 15. A plurality of rear side cleaning nozzles 18 are arranged below the cleaning holes 14, 15 with the ejection ports thereof directing the cleaning holes 14, 15 and a pure water supply part is coupled with the rear side cleaning nozzles 18. This constitution allows cleaning on the rear side of a substrate while suction holding.


Inventors:
KIZAKI KOJI
MORINISHI TAKEYA
Application Number:
JP21301293A
Publication Date:
March 10, 1995
Filing Date:
August 27, 1993
Export Citation:
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Assignee:
DAINIPPON SCREEN MFG
International Classes:
B05C1/02; B05C11/08; G03F7/30; H01L21/027; H01L21/304; H01L21/68; H01L21/683; (IPC1-7): H01L21/027; B05C1/02; B05C11/08; G03F7/30; H01L21/304; H01L21/68
Attorney, Agent or Firm:
Yukio Ono (1 person outside)