Title:
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
Document Type and Number:
Japanese Patent JP2017154111
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of performing a prescribed treatment to a substrate without shifting dirt adhering onto an end face part to a substrate surface.SOLUTION: A substrate treatment apparatus for applying a treatment by a fluid to a flat substrate (glass substrate 10) conveyed by a conveyance mechanism 120 has a constitution having an end dirt removal mechanism for removing dirt on an end side part of the substrate 10 on the upstream side in the conveyance direction D of a treatment mechanism for discharging the fluid to the conveyed substrate 10.SELECTED DRAWING: Figure 2A
Inventors:
IMAOKA YUICHI
Application Number:
JP2016041813A
Publication Date:
September 07, 2017
Filing Date:
March 04, 2016
Export Citation:
Assignee:
SHIBAURA MECHATRONICS CORP
International Classes:
B08B3/02; B08B1/04; B08B5/02; F26B15/12; G02F1/13; H01L21/304
Attorney, Agent or Firm:
Masaki Higuchi
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