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Patent Searching and Data


Title:
SUBSTRATE TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JP2009194067
Kind Code:
A
Abstract:

To improve the throughput of substrate treatment by shortening a time required for the transfer of a substrate.

Transfer units 13a, 13b, and 19a, 19b are arranged in both sides of a first substrate treatment section 101 and a third substrate treatment section 103 extended linearly in the (+X) direction, respectively. Moreover, a pair of coating units 14a, 14b are provided at ends of the transfer paths 131a, 131b as traveling paths of the transfer units 13a, 13b. The transfer units 13a, 13b transfer the substrate 90 to the coating units 14a, 14b respectively. The substrate 90 transferred is carried out by the transfer unit 15. In addition, the transfer unit 13b conducts the in-phase transfer operation at a delay of a predetermined number of operations to the transfer unit 13a.


Inventors:
Kimura, Yoshikazu
Application Number:
JP2008000031760
Publication Date:
August 27, 2009
Filing Date:
February 13, 2008
Export Citation:
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Assignee:
DAINIPPON SCREEN MFG CO LTD
International Classes:
H01L21/027; B05C5/02; B05C13/02; G03F7/16; H01L21/304; H01L21/02; B05C5/02; B05C13/02; G03F7/16