Title:
SUBSTRATE TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JP3948916
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To change the composition of an apparatus easily and reduce a cost required for the change of the composition by checking the composition of the apparatus in advance and then converting a control command.
SOLUTION: A substrate treatment apparatus comprises a unit such as a first treatment section 17 for conducting a treatment on a substrate, a host computer 25 for controlling the unit such as the first treatment section 17 according to a recipe specifying the treatment of the substrate, and a first control section 31 and a second control section 35 which check the composition of the apparatus including the unit such as the first treatment section 17 in advance, and then convert a control command from the host computer 25 according to the composition. Since the composition of the apparatus is checked in advance, the control command can be converted according to the composition. The control command in the program need not be changed according to the change in composition of the apparatus, allowing an easy change in composition and reducing a cost required for the change in the composition.
Inventors:
Yasunori Nakamura
Eiji Gracehara
Hiroshi Azuma
Eiji Gracehara
Hiroshi Azuma
Application Number:
JP2001246652A
Publication Date:
July 25, 2007
Filing Date:
August 15, 2001
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
B08B3/04; H01L21/02; H01L21/304; H01L21/306; H01L21/677; H01L21/68; (IPC1-7): H01L21/02; B08B3/04; H01L21/304; H01L21/306; H01L21/68
Domestic Patent References:
| JP2001015398A | ||||
| JP2000195769A | ||||
| JP7022302A |
Attorney, Agent or Firm:
Tsutomu Sugiya