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Patent Searching and Data


Title:
SUBSTRATE TREATMENT DEVICE AND SUBSTRATE PROCESS METHOD
Document Type and Number:
Japanese Patent JP2018162143
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a technique capable of detecting and correcting the meandering state of a substrate with usage of an existing transport mechanism in a processing unit.SOLUTION: This substrate treatment device includes a transport mechanism 10, a force detection unit 30, a meandering correction unit 40, a processing unit, and a control unit. The transport mechanism 10 conveys an elongated substrate 9 in the longitudinal direction along a conveying path constituted by a plurality of rollers of the transport mechanism 10. The force detection unit 30 measures the force in the rotational axis direction applied to a detection roller 31 which is at least one of the plurality of rollers. The control unit predicts the meandering state of the base material 9 based on the force in the rotation axis direction applied to the detection roller 31 and outputs meandering prediction information. The meandering correction unit 40 corrects the relative position in the width direction of the substrate 9 with respect to the processing unit based on the meandering prediction information. This makes it possible to detect the meandering state of the substrate 9 with usage of the rollers of the existing conveyance mechanism 10 in the processing unit and to correct the relative position in the width direction of the substrate 9 with respect to the processing unit.SELECTED DRAWING: Figure 4

Inventors:
林 真司
Application Number:
JP2017060260A
Publication Date:
October 18, 2018
Filing Date:
March 26, 2017
Export Citation:
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Assignee:
株式会社SCREENホールディングス
International Classes:
B65H23/038; B65H43/00
Attorney, Agent or Firm:
西田 隆美