To provide a substrate treatment device in which a substrate is not required to be rotated even when fluid is required to be supplied from a plurality of different directions toward the surface of the substrate in order that the substrate is treated in good order.
A water jet head 4 comprises pure water outlets 423, 443 facing with each other in an X-axis direction and pure water outlets 433, 454 facing with each other in a Y-axis direction. Pure water supplied to the upper surface of the substrate from the outlets 423, 443 forms water flows thereon in a positive direction and a negative direction, respectively, along the X-axis direction. Pure water supplied to the upper surface of a wafer W from the outlets 453, 433 forms water flows on the upper surface of the substrate in a positive direction and a negative direction along the Y-axis direction. While a laser beam is irradiated on the substrate, pure water is sequentially discharged from the outlets 423, 433, 443, 453.