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Title:
SUBSTRATE FOR ULTRAFINE PARTICLE EJECTING FORMATION, MOUNTING METHOD OF METAL MASK, METAL MASK USED IN THE SAME METHOD AND HEATING BASE PLATE
Document Type and Number:
Japanese Patent JP2003093936
Kind Code:
A
Abstract:

To mount a metal mask and a substrate excellently in operability with respect to a heating base plate by using a metal mask of simple structure in a method for ejecting ultrafine particles from a nozzle and forming fine- patterned article on the substrate.

The substrate 2 is previously attached between holding pieces 1b, 1b which are formed curvedly on the side opposite to the metal mask 1. At this time, the positioning of the metal mask 1 and the substrate 2 is also easily performed by a positioning piece 1c of the metal mask 1. Subsequently, the heating base plate 3 is inserted between the holding pieces 1b, 1b of the metal mask 1 in the state that the metal mask 1 and the substrate 2 are integrated into one body, the substrate 2 and the metal mask 1 are mounted on the heating base plate 3 with a prescribed positional relation.


Inventors:
SAITO MASATOSHI
AKIYAMA ZENICHI
Application Number:
JP2001288890A
Publication Date:
April 02, 2003
Filing Date:
September 21, 2001
Export Citation:
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Assignee:
RICOH KK
International Classes:
B81B1/00; B05B15/04; B05C17/06; B05D1/32; B81C1/00; (IPC1-7): B05B15/04; B05C17/06; B05D1/32; B81B1/00