Title:
SUBSTRATE WASHER
Document Type and Number:
Japanese Patent JP3628879
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate washer by which a substrate can be cleanly subjected to washing treatment without using much pure water.
SOLUTION: A substrate treating device 1 is provided with a treating tank 11 for subjecting a substrate W to washing treatment by pure water stored therein, a pure water feeding path 13 for feeding pure water into the treating tank 11 through feeding nozzles 12, a discharge port 14 for quickly discharging the pure water stored in the treating tank 11, a pair of cover members 15 arranged above the treating tank 11, a pure water feeding path 16 for feeding pure water to the substrate W through pure water nozzles arranged on the cover members 15, and a gaseous nitrogen feeding path 17 for feeding gaseous nitrogen into the treating tank 11 through gaseous nitrogen nozzles arranged on the cover members 15.
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Inventors:
Yusuke Muraoka
Application Number:
JP19497398A
Publication Date:
March 16, 2005
Filing Date:
June 24, 1998
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
B08B5/00; B08B3/04; H01L21/304; (IPC1-7): B08B3/04; B08B5/00; H01L21/304
Domestic Patent References:
| JP9097778A | ||||
| JP10163158A | ||||
| JP10079370A | ||||
| JP9069509A | ||||
| JP8148464A |
Attorney, Agent or Firm:
Takashi Otsubo
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