Title:
SUBSTRATE WASHING APPARATUS, AND APPARATUS AND METHOD OF MONITORING STATE THEREOF
Document Type and Number:
Japanese Patent JP2007220786
Kind Code:
A
Abstract:
To provide an apparatus of monitoring the contact state between a brush and a substrate during substrate washing in a substrate washing apparatus.
The apparatus of monitoring the contact state between the substrate and the brush comprises a mechanism (107) for collecting the torque data of a motor for turning the brush during substrate washing and during idle running of the brush when the substrate is not washed, and a mechanism (109) which calculates a difference between the torque data of the motor collected during substrate washing and the torque data of the motor collected during idle running of the brush when the substrate is not washed and monitors the difference.
COPYRIGHT: (C)2007,JPO&INPIT
Inventors:
SANADA SATORU
Application Number:
JP2006037814A
Publication Date:
August 30, 2007
Filing Date:
February 15, 2006
Export Citation:
Assignee:
NIKON CORP
International Classes:
H01L21/304; B08B1/04; G02F1/13
Attorney, Agent or Firm:
Patent business corporation Okada Fusimi Hirano