SUBSTRATE WASHING BRUSH - SHIMADA PHYSICAL CHEM IND CO

Title:

SUBSTRATE WASHING BRUSH

Document Type and Number:

Japanese Patent JP2007007501

Kind Code:

A

Abstract:

To provide a self-washable substrate washing brush removing foreign matter of various sizes, and easily adjusting pressing quantity to the substrate.

This substrate washing brush is formed by providing channel brushes 20 formed by holding bristle-bundles with band-like long metallic fixtures, and by spirally winding several channel brushes 20 around a roller-like brush shaft 10 with equal intervals. By rotating the brush, a washing solution on the surface of the substrate is discharged along the equally intervals traces. Three channel brushes 20a, 20b, 20c are spirally wound around the brush shaft 10 with a tilted angle of 5-15°. Respective channel brushes 20 have different thicknesses (L, M, S) of bristles, being disposed in the order of getting softer stepwise from hard one discharging the washing solution without falling by the solution pressure.

Inventors:

HAGIWARA TAKEHIRO
KATAOKA TATSUO
NARUOKA MASAAKI
SHIRAISHI SATOSHI
NAGASE AKIRA
YONEDA HISAFUMI
HORIIKE HIDEO
SUZUKI SATOSHI

Application Number:

JP2005188476A

Publication Date:

January 18, 2007

Filing Date:

June 28, 2005

Export Citation:

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Assignee:

SHIMADA PHYSICAL CHEM IND CO

International Classes:

B08B7/04; A46B7/10; A46B9/02; A46B13/02; B08B1/04; B08B3/04; G02F1/13; G02F1/1333; H01L21/304

Domestic Patent References:

JPH09125263A	1997-05-13
JP2001276652A	2001-10-09
JPS60147669U	1985-10-01

Attorney, Agent or Firm:

Makoto Hagiwara

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