Title:
SUBSTRATE WASHING AND DRYING DEVICE
Document Type and Number:
Japanese Patent JP2648286
Kind Code:
B2
Abstract:
PURPOSE: To provide a dry washing and drying device free from electrostatic discharge failure and dust deposit by specifying a gas pressure for injecting to a substrate at the time of transfer, a position and an angle of irradiating a soft x-ray to be irradiated, and an energy to be issued.
CONSTITUTION: A device 1 is for washing and/or drying a substrate 3 comprising an organic thin film via an electrode on one surface of the substrate 3 which is glass and the like. Basically, it comprises a soft x-ray irradiating part 7 for issuing the soft x-ray to the substrate 3 and a washing and drying part 9 for washing and drying the substrate 3. Here the washing and drying part 9 injects a clean gas of a pressure of 1 to 5kg/cm2 and sucks unnecessary objects. For eliminating electrostatic force, the soft x-ray irradiating part 7 is mounted at any height under 1500mm and at any angle between 5 and 180 degrees to ensure that the soft x-ray can be issued. Its irradiation energy is 4 to 9.5KeV.
Inventors:
KONO MAKOTO
HIRANO MASAYUKI
HIRANO MASAYUKI
Application Number:
JP18357994A
Publication Date:
August 27, 1997
Filing Date:
August 04, 1994
Export Citation:
Assignee:
IINUMA GEEJI SEISAKUSHO KK
HAMAMATSU HOTONIKUSU KK
HAMAMATSU HOTONIKUSU KK
International Classes:
G02F1/1333; B08B7/00; F26B25/00; H01L21/304; H05K3/26; (IPC1-7): H01L21/304; B08B7/00; F26B25/00; G02F1/1333; H01L21/304
Attorney, Agent or Firm:
Takashi Ishida (3 others)