To provide a substrate washing method capable of efficiently and certainly washing contaminant deposited on a substrate, and a substrate washing device.
The substrate 11 is supported and an ultrasonic vibration part 40 is made opposed to a peripheral edge of the supported substrate. A washing liquid W is continuously fed between the peripheral edge of the substrate and the ultrasonic vibration part, the ultrasonic vibration part is floated against the peripheral edge of the substrate by a liquid pressure of the washing liquid and surface tension and a liquid film is formed between the peripheral edge of the substrate and the ultrasonic vibration part. The ultrasonic wave is applied from the ultrasonic vibration part through the liquid film to remove the contaminant deposited on the peripheral edge of the substrate.
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Sadao Muramatsu
Ryo Hashimoto
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