To provide a substrate washing nozzle capable of preventing the curtain-like liquid film, which is ejected from a nozzle opening, from expanding into a tapered form and capable of allowing the ejection point of a nozzle to approach the surface of a substrate to eject it to the surface of the substrate at a low angle.
The substrate washing nozzle 1 for ejecting a washing liquid toward the fed substrate to wash the surface of the substrate has a first nozzle opening 2 and a second nozzle opening 3 both of which extend in the direction crossing the feed direction of the substrate at a right angle to be formed into a slit-like shape so as to become almost parallel to each other. Liquid film flows 7a and 7b, which are formed by respectively ejecting the washing liquid from the first and second nozzle openings 2 and 3, are attracted to each other to form a single curtain-like liquid film flow 7c.
Takeshi Sugiyama
Minetarou Hirose
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