Title:
SUBSTRATE WASHING UNIT
Document Type and Number:
Japanese Patent JP3865602
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a simple substrate washing unit which can wash the fringe of a substrate effectively.
SOLUTION: A plurality of points of the fringe We of a substrate W are supported by supporting pins 1 on a spin chuck 3 where the supporting pins 1 stand, so that the substrate W is held in a horizontal condition. 2 fluid nozzle 9 is disposed and secured right above the fringe We, and the washing and processing of the fringe We is done by the 2 fluid nozzle 9. At almost the same time, a washing brush 31 washes and processes the substrate W while rocking at the territory other than the fringe We. Because mist M discharged from the 2 fluid nozzle 9 is trace quantity and droplets of the mist M are minute, the splashing of the mist M by bounce can be reduced at a plurality of points of the fringe We supported by supporting pins 1 on the spin chuck 3, and at these points, the mist M can be supplied to do the washing.
Inventors:
Masanobu Sato
Application Number:
JP2001182839A
Publication Date:
January 10, 2007
Filing Date:
June 18, 2001
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
B08B3/02; B08B1/04; G02F1/13; G02F1/1333; H01L21/00; H01L21/304; H01L21/306; (IPC1-7): B08B3/02; B08B1/04; G02F1/13; G02F1/1333; H01L21/304; H01L21/306
Domestic Patent References:
| JP10125641A | ||||
| JP8318181A | ||||
| JP2000277476A |
Attorney, Agent or Firm:
Tsutomu Sugiya