Title:
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE TYPE MASK BLANK AND REFLECTIVE TYPE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2022159362
Kind Code:
A
Abstract:
To provide a substrate with multilayer reflective film that is used for manufacturing a reflective type mask having a multilayer reflective film having high reflectance to exposure light and low film stress.SOLUTION: Provided is a substrate with multilayer refractive film, which is a substrate with multilayer refractive film that is composed of a multilayer film, in which a low refractive index layer and a high refractive index layer are alternately laminated, on a substrate, and includes a multilayer reflective film for reflecting exposure light, and in which, characterized, the multilayer reflective film contains krypton (Kr).SELECTED DRAWING: Figure 1
Inventors:
Hirofumi Kozakai
Takahiro Onoe
Takahiro Onoe
Application Number:
JP2022123750A
Publication Date:
October 17, 2022
Filing Date:
August 03, 2022
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G03F1/24; C23C14/06
Domestic Patent References:
| JP2007041603A | 2007-02-15 | |||
| JP2005250187A | 2005-09-15 | |||
| JP2004331998A | 2004-11-25 |
Foreign References:
| WO2016043147A1 | 2016-03-24 | |||
| WO2015037564A1 | 2015-03-19 |
Attorney, Agent or Firm:
Patent Attorney Corporation Tsukuni
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