To enable to easily manufacture desired electrode patterns under conditions of low resistivity and without being affected by differences in materials and surface properties of a substrate layer.
The specified pattern of a colored layer 2 comprising coloring matter layers R, G and B on a glass substrate 1 is formed in the form of stripes (Fig.3 (a)). The colored layer 2 is coated with a polymer resin film 3 partly exposing the glass substrate 1 (Fig.3 (b)). By adjusting sputtering conditions the first ITO film 4 is laminated, whose resistivity is 1.5×10-1 to 3.0×10-1 Pa and coating thickness is 5 to 50 nm (Fig.3 (c)). By the arch discharge ion plating method the second ITO film 4 whose coating thickness is 100 to 300 nm is laminated (Fig.3 (d)). After forming a masking pattern with photoresists and conducting an etching treatment with HCl-FeCl3 as the etchant, electrode patterns are formed by removing the resists.
KIYOTA SHIYOUGO
KATOU YUKIHIRO
