To provide a substrate exhibiting a transparent electrode showing good characteristics in terms of electrical conductivity, transparency, and resistance to environmental variability.
The substrate has the transparent electrode having a layer of transparent conductive oxide that consists mainly of at least one layer of zinc oxide on a base material, the layer of transparent conductive oxide having a crystalline structure that is c-axis oriented with respect to the base material. In the substrate, the layer of transparent conductive oxide is doped with hydrogen. In a method of manufacturing the substrate having a transparent electrode having a layer of transparent conductive oxide that consists mainly of at least one layer of zinc oxide on a base material, the layer of transparent conductive oxide is formed as a film by sputtering utilizing a plasma discharge. During the sputtering, argon and hydrogen are essential as a carrier gas. At least one kind selected from oxygen and carbon dioxide is added to the used carrier gas. The whole carrier gas contains 2 to 30 vol.% of hydrogen and 1 to 30 vol.% of oxygen and/or carbon dioxide.
YAMAMOTO KENJI
JPN6013044913; 電子情報通信学会技術研究報告 Ｖｏｌ．１０８，Ｎｏ．２６９, 2008, ｐ．１９-２２
JPN6013044915; Ｊｏｕｒｎａｌ ｏｆ Ｐｈｙｓｉｃｓ Ｄ：Ａｐｐｌｉｅｄ Ｐｈｙｓｉｃｓ Ｖｏｌ．４１，Ｎｏ．９, 2008, ｐ．１-７
JPN6013044906; Ｊｏｕｒｎａｌ ｏｆ Ｃｒｙｓｔａｌ Ｇｒｏｗｔｈ Ｖｏｌ．２９３，Ｎｏ．２, 2006, ｐ．２５３-２５７
JPN6013044902; 高知工業高等専門学校学術紀要 第３９号, 1995, ｐ．４５-５１