Title:
スルホン酸誘導体及び光酸発生剤
Document Type and Number:
Japanese Patent JP5747311
Kind Code:
B2
Inventors:
Yasuhiro Hosoi
Kaneko
Kaneko
Application Number:
JP2011551796A
Publication Date:
July 15, 2015
Filing Date:
January 13, 2011
Export Citation:
Assignee:
Toyo Gosei Co., Ltd.
International Classes:
C07C309/12; C07C25/00; C07C381/12; C09K3/00; G03F7/004; G03F7/039
Domestic Patent References:
| JP2010256856A | 2010-11-11 |
Other References:
JPN6011008765; Ｍｉｎｇｘｉｎｇ Ｗａｎｇ ｅｔ ａｌ．: 'Ｎｅｗ Ａｎｉｏｎｉｃ Ｐｈｏｔｏａｃｉｄ Ｇｅｎｅｒａｔｏｒ Ｂｏｕｎｄ Ｐｏｌｙｍｅｒ Ｒｅｓｉｓｔｓ ｆｏｒ ＥＵＶ Ｌｉｔｈｏｇｒａｐｈｙ' Ｍａｃｒｏｍｏｌｅｃｕｌｅｓ ４０, 2007, ８２２０-８２２４
JPN6011008766; Ｍｉｎｇｘｉｎｇ Ｗａｎｇ ｅｔ ａｌ．: 'Ｆｌｕｏｒｉｎｅ-ｃｏｎｔａｉｎｅｄ ｐｈｏｔｏａｃｉｄ ｇｅｎｅｒａｔｏｒｓ （ＰＡＧｓ） ａｎｄ ｃｏｒｒｅｓｐｏｎｄｉｎｇ ｐｏｌｙｍｅｒ ｒｅｓｉｓｔｓ' Ｊｏｕｒｎａｌ ｏｆ Ｆｌｕｏｒｉｎｅ Ｃｈｅｍｉｓｔｒｙ １２９, 2008, ６０７-６１２
JPN6011008766; Ｍｉｎｇｘｉｎｇ Ｗａｎｇ ｅｔ ａｌ．: 'Ｆｌｕｏｒｉｎｅ-ｃｏｎｔａｉｎｅｄ ｐｈｏｔｏａｃｉｄ ｇｅｎｅｒａｔｏｒｓ （ＰＡＧｓ） ａｎｄ ｃｏｒｒｅｓｐｏｎｄｉｎｇ ｐｏｌｙｍｅｒ ｒｅｓｉｓｔｓ' Ｊｏｕｒｎａｌ ｏｆ Ｆｌｕｏｒｉｎｅ Ｃｈｅｍｉｓｔｒｙ １２９, 2008, ６０７-６１２
Attorney, Agent or Firm:
Hiroyuki Kurihara
Muranaka
Muranaka