SULFONIC ACID ESTER COMPOUND, POLYMER, RESIST MATERIAL AND METHOD FOR FORMING PATTERN

Title:

SULFONIC ACID ESTER COMPOUND, POLYMER, RESIST MATERIAL AND METHOD FOR FORMING PATTERN

Document Type and Number:

Japanese Patent JP2004244436

Kind Code:

A

Abstract:

To provide a new polymer useful as a resist material having excellent transmittance in vacuum ultraviolet rays such as ≤300 nm, especially F2 (157 nm), Kr2 (146 nm), KrAr (134 nm) or Ar2 (126 nm), especially a chemically amplified resist material and a base resin thereof, a sulfonic acid ester compound to be a raw material monomer thereof and to provide a method for forming a pattern using the resist material.

The sulfonic acid ester compound is represented by formula (1) (wherein, R1 to R3 are each a hydrogen atom, a fluorine atom or an alkyl group or a fluorinated alkyl group; and at least one of R1 to R3 contains a fluorine atom). The resist material is sensitive to high energy rays and has alkali-soluble contrast and excellent plasma etching resistance without deteriorating transparency at ≤200 nm wavelength.

Inventors:

HARADA YUJI
HATAKEYAMA JUN
KAWAI YOSHIO
SASAKO MASARU
ENDO MASATAKA
KISHIMURA SHINJI
MAEDA KAZUHIKO
KOMORIYA HARUHIKO
MIYAZAWA SATORU

Application Number:

JP2003032584A

Publication Date:

September 02, 2004

Filing Date:

February 10, 2003

Export Citation:

Click for automatic bibliography generation Help

Assignee:

SHINETSU CHEMICAL CO
MATSUSHITA ELECTRIC IND CO LTD
CENTRAL GLASS CO LTD

International Classes:

C07C309/67; C08F28/02; C08F212/14; C08F220/12; C08F232/00; G03F7/004; G03F7/027; G03F7/039; H01L21/027; (IPC1-7): C08F28/02; C07C309/67; C08F212/14; C08F220/12; C08F232/00; G03F7/004; G03F7/027; G03F7/039; H01L21/027

Attorney, Agent or Firm:

Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi

Previous Patent: AQUEOUS EMULSION OF RESIN COMPOSITION AND SURFACE COATING AGENT USING THE SAME

Next Patent: SULFONATED AROMATIC POLYETHEREAL COMPOUND, ITS COMPOSITE AND METHOD FOR PRODUCING THE SAME