Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SULFONIUM SALT AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JP2000212158
Kind Code:
A
Abstract:

To provide a new sulfonium salt useful as a photo-acid initiator or a photo-radical initiator, when a photosensitive curable resin is polymerized, and to provide a method for producing the sulfonium compound by a single-stage reaction at a high yield, not using an expensive sulfoxide compound as a starting material, nor a Grignard reagent.

A compound of formula I [R1 is H, a 1-20C alkyl, a halogen, an alkoxyl or the like; R2 is a 1-20C alkyl, aryl or allyl; (n) is 0-20], preferably a compound of formula II. The compound is obtained by reacting (A) a sulfide compound expressed by formula III with (B) a perfluoroalkanesulfonic anhydride expressed by the formula: [CF3(CF2)nSO2]2O, wherein the component B is used in an amount of 0.2-2.0 mol per mol of the component A, and the reaction is carried out at a reaction temperature within the range of -100 to 100°C.


Inventors:
PARK JOO HYEON
KIM JAE YONG
LEE JONG BUM
Application Number:
JP16963199A
Publication Date:
August 02, 2000
Filing Date:
June 16, 1999
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
KOREA KUMHO PETROCHEM CO LTD
International Classes:
C07C303/32; C07C381/12; C08F2/48; G03F7/004; G03F7/038; B01J27/02; (IPC1-7): C07C381/12; C08F2/48; G03F7/004; G03F7/038
Attorney, Agent or Firm:
Hiroyuki Ikeuchi (3 outside)