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Title:
SULFONIUM SALT, POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2019026572
Kind Code:
A
Abstract:
To provide a positive or negative resist composition having high sensitivity, small LWR and CDU, and excellent resolution, and to provide a pattern forming method using the same.SOLUTION: A sulfonium salt contains an anion having a 2-acyl-1,1,3,3,3-pentafluoropropane-1-sulfonate structure and a sulfonium cation represented by formula (1b) or (1c) (where A is an organic group containing a polymerizable group; R-Rare each independently halogen, nitro, cyano, or a linear/branched/cyclic C1-20 hydrocarbon group which may have a hetero atom; X is a single bond, O, NH, or the like; p, q' and r' are each independently an integer of 0-4; and q and r are each independently an integer of 0-5).SELECTED DRAWING: None

Inventors:
大橋 正樹
畠山 潤
阿達 鉄平
Application Number:
JP2017145057A
Publication Date:
February 21, 2019
Filing Date:
July 27, 2017
Export Citation:
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Assignee:
信越化学工業株式会社
International Classes:
C07C381/12; C07C309/12; C07D279/20; C07D327/08; C07D335/12; C07D335/16; C07D339/08; C08F220/38; G03F7/004; G03F7/039; G03F7/20
Attorney, Agent or Firm:
特許業務法人英明国際特許事務所



 
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