Title:
スルホキシド-ピロリドン(ピロリジノン)-アルカノールアミン系剥離および洗浄組成物
Document Type and Number:
Japanese Patent JP2004538503
Kind Code:
A
Abstract:
The present invention relates to, inter alia, a composition for stripping photoresist from substrates comprising: about 5% to about 50% by weight of an alkyl substituted pyrrolidone, an alkyl substituted piperidone, or a mixture thereof, about 0.2% to about 20% of one or more alkanolamines, and about 50% to about 94% of a sulfoxide, sulfoxone, or mixture thereof. Advantageously, the composition can remove copper from a copper substrate at a rate of less than about 10 Å per minute when the substrate is immersed in the composition which is held at 70° C. for 30 minutes and rotated relative to the composition at about 200 revolutions per minute.
Inventors:
Elephant, de ring
Small, Robert, Jay.
Small, Robert, Jay.
Application Number:
JP2003512791A
Publication Date:
December 24, 2004
Filing Date:
July 12, 2002
Export Citation:
Assignee:
EK Technology, Incorporated
International Classes:
C11D7/32; C11D7/34; C11D7/60; C11D11/00; C11D17/00; G03F7/42; H01L21/027; (IPC1-7): G03F7/42; C11D7/32; C11D7/34; C11D7/60; C11D17/00; H01L21/027
Attorney, Agent or Firm:
Hiroshi Kobayashi
Eiji Katayama
Junko Kobayashi
Kaoru Kuroda
Norio Omori
Eiji Katayama
Junko Kobayashi
Kaoru Kuroda
Norio Omori