SUPERCRITICAL DRYING APPARATUS

Title:

SUPERCRITICAL DRYING APPARATUS

Document Type and Number:

Japanese Patent JP2000340540

Kind Code:

A

Abstract:

To easily load and unload a semiconductor substrate into or from a reaction treatment chamber by equipping a drive means for performing guidance, so that the approach/separation traveling operation of a lid body can be made linearly, without rotation and adding an approach/separation traveling operation to the lid body.

A lid body 7 is supported by a guide shaft 8 of a guiding means. The guide shaft 8 is supported, while being spanned between a support 9 and a support arm that is formed at a reaction bath. The support 9 is supported by a substrate 4 via a support leg similarly to the reaction bath. The lid body 7 is supported slidably by the guide shaft 8 and moves so that is approaches to or is separated. This movement is straight and will not accompany the rotation of the lid body 7. The lid body 7 is made of a stainless steel material and is provided with a bush that can be slid easily and is strong against wear at the slide part with the guide part 8. A screw shaft 15 as a drive means for adding an approach/separation traveling operation, that presses and releases the lid body 7 to and from the reaction bath is provided at the center of the support 9.

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