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Title:
SUPERSATURATED GAS-DISSOLVED LIQUID MANUFACTURING APPARATUS
Document Type and Number:
Japanese Patent JP2013123700
Kind Code:
A
Abstract:

To provide a supersaturated gas-dissolved liquid manufacturing apparatus capable of preventing microbubbles from generating in a liquid in a separation tank, and maintaining the supersaturation degree of the gas in the liquid without lowering it.

A supersaturated gas-dissolved liquid manufacturing apparatus 10A includes a water tank 1, a mixing part 2, a pressurization part 3 and a separation part 4, and an exhaustion valve part 42 of the separation part 4 communicates with a separation tank 41 via a gas circulating pipe 43 and a liquid circulating pipe 44 respectively. The gas circulating pipe 43 has a form which extends to a position that is higher than the height position of an exhaust port 421 and then leads to the upper part of the separation tank 41. The liquid circulating pipe 44 communicates with the separation tank 41 at a position that is lower than the communication position of the gas circulating pipe 43 and the separation tank 41, also at the position lower than the height position of the exhaust port 421 and also at the position lower than the prescribed first height position. The prescribed first height position is set at the lowest position within the changing height position of the liquid surface of the liquid in the separation tank 41 during operation of the separation part 4.


Inventors:
HIROTA SHINYA
YANO HIROSHI
SAKAI AYUMI
Application Number:
JP2011275704A
Publication Date:
June 24, 2013
Filing Date:
December 16, 2011
Export Citation:
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Assignee:
PANASONIC CORP
International Classes:
B01F1/00; B01D19/00; B01F3/04; B01F5/10; B01F15/00
Attorney, Agent or Firm:
Samejima Mutsumi
Mitsuo Tanaka
Yasuo Shibata