Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SUPPLY DEVICE AND SUPPLY METHOD OF AN ELECTROLYTIC SOLUTION
Document Type and Number:
Japanese Patent JP2014145093
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a supply device and a supply method of an electrolytic solution each capable of adjusting to constant volumes of metals supplied into an electrolytic tank regardless of variations of metal ion concentrations within the electrolytic solution.SOLUTION: The provided supply device A of an electrolytic solution includes: a liquid transport means P for transporting an electrolytic solution into an electrolytic tank B; a flow meter 2 capable of measuring flow rates of metal ions included within the electrolytic solution without being affected by electrolytic currents of the electrolytic tank B; and a valve 3 capable of controlling the supply flow rate of the electrolytic solution. Since flow rates of metal ions included within the electrolytic solution can be measured by the flow meter 2, the flow rate of the supplied electrolytic solution can be increased or decreased in accordance with metal ion concentration variations of the electrolytic solution by controlling the valve 3 so as to realize a fixed measurement value of the flow meter 2, and quantities of metals supplied into the electrolytic tank B can be adjusted fixedly regardless of variations of the metal ion concentrations of the electrolytic solution.

Inventors:
SHINGU MASAHIRO
IMAMURA MASAKI
TAKAISHI KAZUYUKI
Application Number:
JP2013012995A
Publication Date:
August 14, 2014
Filing Date:
January 28, 2013
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SUMITOMO METAL MINING CO LTD
International Classes:
C25C7/06; C25C1/12
Domestic Patent References:
JPH0943011A1997-02-14
JP2003073879A2003-03-12
JP2007500790A2007-01-18
Attorney, Agent or Firm:
Yasunobu Yamauchi
Nakai 博
Yamauchi Growth