Title:
SUPPORT FOR LITHOGRAPHIC PRINTING PLATE AND MANUFACTURE THEREOF, AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
Document Type and Number:
Japanese Patent JP3497005
Kind Code:
B2
Abstract:
PURPOSE: To provide a support for a lithographic printing plate with good printability in terms of a hydrophilic property, water retentivity, and adhesion to a photosensitive layer, the manufacturing method of the support, and a photosensitive lithographic printing plate.
CONSTITUTION: A support for a lithographic printing plate which has a smooth surface 3μm or less in Rmax and grain structure in which the opening diameter of micropores is 8nm or more and the depth is 800nm or more. A manufacturing method for the support in which the surface of an aluminum plate, after being roughened, is subjected to chemical treatment to dissolve a sharp part of the roughened surface for smoothing so that Rz/Ra is 95% or less in comparison with that before the treatment. A photosensitive lithographic printing plate in which a photosensitive layer is formed on the support.
Inventors:
Koji Takagi
Yasuhisa Sugi
Shinichi Matsubara
Yasuhisa Sugi
Shinichi Matsubara
Application Number:
JP9157195A
Publication Date:
February 16, 2004
Filing Date:
March 24, 1995
Export Citation:
Assignee:
Kodak Polychrome Graphics Co., Ltd.
International Classes:
G03F7/00; B41N3/00; B41N3/03; B41N3/04; (IPC1-7): B41N3/03; B41N3/04
Domestic Patent References:
| JP624166A | ||||
| JP692052A | ||||
| JP1188699A | ||||
| JP60190392A | ||||
| JP6328876A |
Attorney, Agent or Firm:
Masatake Shiga (6 people outside)