To attain a surface acoustic wave device having excellent temperature characteristics and a sufficient electromechanical coupling coefficient.
A surface acoustic wave device 1 has: a sapphire substrate 10 having a C plane as a main surface; an aluminum nitride film 30 which is formed on a main surface 11 of the sapphire substrate 10; comb-like electrodes 21, 22 which are formed on the surface of the aluminum nitride film 30 to excite surface acoustic waves; and a silicon dioxide film 40 which covers the comb-like electrodes 21, 22 and the surface of the aluminum nitride film 30. The surface acoustic waves use a secondary mode of Sezawa waves. The relationship between a standardized film thickness KH-AIN of the aluminum nitride film 30 and a standardized film thickness KH-SiO2 of the silicon dioxide film 40 is set to an appropriate range, and thereby the surface acoustic wave device 1 having excellent temperature characteristics, a sufficient electromechanical coupling coefficient K2 required for excitation, and a high sonic velocity is provided.
FUJIOKA SHINJI
JP2008244523A | 2008-10-09 | |||
JPH08316779A | 1996-11-29 | |||
JP2002237737A | 2002-08-23 | |||
JP2002152000A | 2002-05-24 | |||
JPH04109709A | 1992-04-10 |
Osamu Suzawa
Kazuhiko Miyasaka