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Title:
SURFACE-ANALYZING APPARATUS
Document Type and Number:
Japanese Patent JPH11160330
Kind Code:
A
Abstract:

To provide a probe microscope which constitutes a means lessening a scattering light by a wafer pattern through irradiation with a beam light, thereby enabling distinction of a foreign article from a scattering light by the foreign article and a means enabling detection of a position of the foreign article.

A sample 1 is loaded on three-dimensional driving stages 3, 4, 5 via a sample holder 2. A surface of the sample 1 is irradiated with a beam light emitted from a beam light oscillator directly or via a polarizing element 7 different from a polarizing light of the beam light. An image of a foreign article on the surface of the sample 1 scattered by the beam light is displayed through a polarizing element 8 different from the beam light on a monitor 11 via a high-sensitivity CCD camera 10 mounted to an optical microscope 9. In order to guide the beam light onto the surface of the sample 1, there are ways, one using an optical fiber and another using an optical component such as a mirror or the like.


Inventors:
WAKIYAMA SHIGERU
FUJINO NAOHIKO
Application Number:
JP33006497A
Publication Date:
June 18, 1999
Filing Date:
December 01, 1997
Export Citation:
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Assignee:
SEIKO INSTR INC
MITSUBISHI ELECTRIC CORP
International Classes:
G01N21/88; G01N21/93; G01N21/94; G01N21/956; G01N23/00; G01N37/00; G01Q10/00; G01Q10/02; G01Q30/00; G01Q30/02; G01Q60/24; G01Q60/50; G01Q70/10; G02B21/00; G21K7/00; H01J3/14; H01J5/16; H01J37/00; H01J40/14; G01Q60/00; (IPC1-7): G01N37/00; G01N21/88; G02B21/00
Attorney, Agent or Firm:
Keinosuke Hayashi