To provide a surface inspection device capable of inspecting with higher sensitivity.

In the surface inspection device 1, an illumination optical system 30 has a constitution having a first polarization element 33 for polarizing light from a lighting system 31, where polarized light acquired by transmission through the first polarization element 33 from the lighting system 31 is irradiated onto the wafer 10 surface. Also, an imaging optical system 40 has a constitution having a second polarization element 43 arranged in the crossed nicol state with respect to the first polarization element 33, where the light, acquired by transmission through the second polarization element 43 from the wafer 10 surface onto which the polarized light is irradiated, is detected. The first polarization element 33 and the second polarization element 43 have each constitution having a plurality of polarization members 34-36, 44-46 disposed side by side on an optical path and having each mutually different wavelength characteristic of an extinction ratio.