Title:
表面検査装置及び表面検査方法
Document Type and Number:
Japanese Patent JP5370155
Kind Code:
B2
Abstract:
A surface examining device exhibiting an improved defect detection accuracy by increasing the amount of information used for pattern defect detection. A diverging light beam emitted from a light source (1) is converted into a linearly polarized light beam by a polarizer (2), converted into a substantially parallel light beam by a concave mirror (3), and projected onto the whole of a wafer (4) i.e., a substrate under examination. The polarized state of the light beam regularly reflected by the wafer (4) is varied by the structural birefringence which a pattern (13) has. Since the polarized state variation by the structural birefringence differs according to the state of the patter (13) such as the line width, the trapezoidality of the cross-section, or the edge roughness, the polarized state variation can be used for pattern defect examination. Since the Stokes parameter of the illuminating light beam is known, the variation of the polarized state by the patter (13) can be determined by measuring the Stokes parameter of the reflected light.
Inventors:
Kuji Yuji
Application Number:
JP2009536979A
Publication Date:
December 18, 2013
Filing Date:
September 30, 2008
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G01N21/88; G01J4/04; G01N21/956; H01L21/66
Domestic Patent References:
| JP2006317314A | 2006-11-24 | |||
| JPH10512678A | 1998-12-02 | |||
| JPH01182737A | 1989-07-20 | |||
| JP2006512588A | 2006-04-13 | |||
| JP2007040805A | 2007-02-15 | |||
| JP2005043265A | 2005-02-17 | |||
| JP2004212125A | 2004-07-29 | |||
| JP2004205500A | 2004-07-22 | |||
| JPS63168541A | 1988-07-12 |
Foreign References:
| WO2007069457A1 | 2007-06-21 |
Attorney, Agent or Firm:
Patent business corporation ofh patent office
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