Title:
SURFACE MICROSTRUCTURE MANUFACTURING METHOD, DIAMOND NANO ELECTRODE MANUFACTURING METHOD, AND ELECTRODE BODY THEREOF
Document Type and Number:
Japanese Patent JP2009129962
Kind Code:
A
Abstract:
To provide a surface microstructure manufacturing method using a nano diamond fine particle, and to provide a diamond nano electrode manufacturing method which uses the microstructure.
There are provided a surface microstructure manufacturing method for manufacturing an unevenness P3 of nano meter order through dry etching by seeding a nano diamond fine particle P2 on the test piece surface of a test piece P1 composed of silicon, gallium arsenide, and diamond and using this as a minute hard mask, and a diamond nano electrode manufacturing method using the microstructure.
Inventors:
Uetsuka, Hiroshi
Yang, Nianjun
Nebel, Christoph
Yang, Nianjun
Nebel, Christoph
Application Number:
JP2007000300368
Publication Date:
June 11, 2009
Filing Date:
November 20, 2007
Export Citation:
Assignee:
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL TECHNOLOGY
International Classes:
H01L21/3065; B82B3/00; H01J1/304; H01J9/02; H01L21/02; B82B3/00; H01J1/30; H01J9/02