PURPOSE: To develop a metal surface polishing method capable of contributing high speed vacuum attainability and super vacuum attainability to a closed space surrounded with the surface to be polished.

CONSTITUTION: In this surface polishing method utilizing mechanical and chemical reaction, by pressing a carrier stuck with mixture constituted by dispersing and mixing abrasive grains in an organic medium containing organic acid against a metal surface and polishing the surface, an adhesive gas quantity on the polishing surface to be worked is decreased, and the metal surface capable of decreasing emission gas in a vacuum territory is formed.