Title:
表面処理シリカ粒子及びその分散体、並びに表面処理シリカ粒子粉体の製造方法
Document Type and Number:
Japanese Patent JP7180583
Kind Code:
B2
Abstract:
To provide a surface-treated silica particle or the like that is re-dispersible in an organic solvent or a photo-reactive liquid compound, and that gives an excellent scratch resistance improvement effect to a cured film of a photo-curable coating composition.SOLUTION: There is provided a surface-treated silica particle obtained by subjecting a sol-gel silica particle surface to a coating treatment with at least one of an organic silicon compound and hydrolysate thereof represented by the following formula (1), 2 pts.mass or more based on 100 pts.mass of sol-gel silica particle, and at least one of an organo-silazane compound represented by the formula (2) NH(SiR43)2 and an organosilane compound represented by the formula (3) R5SiR63, where each of R4 independently represents a monovalent hydrocarbon group; R5 represents a monovalent hydrocarbon group; and R6 represents a hydroxy group, an amino group, an alkoxy group or an acyloxy group. (In the formula, R1 represents a hydrogen atom or an alkyl group; R2 represents an alkylene group; R3 represents a hydrogen atom or an alkyl group; and X1 represents a halogen atom.)SELECTED DRAWING: None
Inventors:
Ryosuke Yoshii
Kazuyuki Matsumura
Kazuyuki Matsumura
Application Number:
JP2019187430A
Publication Date:
November 30, 2022
Filing Date:
October 11, 2019
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C01B33/18; C09C1/30; C09C3/12; C09D4/00; C09D7/62; C09D201/00
Domestic Patent References:
| JP2011521866A | ||||
| JP8206596A | ||||
| JP2013507513A |
Foreign References:
| WO2018196468A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Eimei International Patent Office