Title:
SURFACE TREATING DEVICE USING PLASMA BEAM
Document Type and Number:
Japanese Patent JPH05320887
Kind Code:
A
Abstract:
PURPOSE: To provide the vapor deposition device which can treat materials to be evaporated regardless of their kinds with a single device and freely distributes the energy for evaporation by dissolution and ionization.
CONSTITUTION: One cathode 1 is provided with two or more pieces (N) of anodes 2, 3. A line for supplying a current to at least N-1 pieces among N pieces of the anodes from a DC power source is provided with current control means 6, 7 for controlling the currents to be supplied. Switching elements of an on-off type or pulse width modulating type are used for the current control means 6, 7. As a result, the number of the devices is decreased and the efficiency is improved.
Inventors:
SAKAGAMI FUMIO
SAKAMI TOSHIYUKI
YAMANISHI TOSHIYUKI
SAKAMI TOSHIYUKI
YAMANISHI TOSHIYUKI
Application Number:
JP12850192A
Publication Date:
December 07, 1993
Filing Date:
May 21, 1992
Export Citation:
Assignee:
SUMITOMO HEAVY INDUSTRIES
International Classes:
C23C14/24; C23C14/32; (IPC1-7): C23C14/32; C23C14/24
Attorney, Agent or Firm:
Yosuke Goto (2 outside)