Title:
SURFACE TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP3921234
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a surface treatment device capable of performing steadily and continuously by efficiently heating or cooling where temperature control is required and by obtaining a heat exchanger capable of uniform control at a desired temperature.
SOLUTION: The surface treatment device has a treatment chamber provided with an exhausting means and a gas introducing means. The treatment chamber houses a platform for placing a substrate on and a gas releasing means for releasing gas toward the substrate, and the released gas or its reaction product is used for substrate treatment. The substrate platform, the gas releasing means, or the treatment chamber has a heat exchanger. The heat exchanger has a partition between its two planar bodies for the formation of a passage wherein a fluid flows for heating or cooling to a specified temperature the planar bodies and other members in contact therewith. Each of the two planar bodies is provided with fins arranged in parallel with or at a specified angle from the fluid flow direction.
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Inventors:
Yasumi Sago
Ikeda Makoto
Kaneko Ichiaki
Okada Takushi
Ikeda Makoto
Kaneko Ichiaki
Okada Takushi
Application Number:
JP2002054863A
Publication Date:
May 30, 2007
Filing Date:
February 28, 2002
Export Citation:
Assignee:
Canon ANELVA Corporation
International Classes:
F25D9/00; H01L21/3065; C23C16/46; C23F4/00; H01L21/00; (IPC1-7): H01L21/3065; C23F4/00; F25D9/00; //C23C16/46
Domestic Patent References:
| JP8031755A | ||||
| JP4184912A | ||||
| JP2001082828A |
Foreign References:
| WO1999041778A1 |
Attorney, Agent or Firm:
Jiro Nakanishi
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