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Title:
SURFACE TREATMENT METHOD FOR ELECTRET FILTER
Document Type and Number:
Japanese Patent JP2003210924
Kind Code:
A
Abstract:

To provide a surface treatment method capable of restoring the desired collection capacity of an electret filter by re-charging the whole of the electret filter at the time of regeneration of the electret filter.

A vacuum plasma surface treatment apparatus is equipped with a discharge electrode 2 for generating RF plasma discharge and a conductive sample stand 4 on which the electret filter 3 allowed to be spaced apart from the discharge electrode 2 by a predetermined distance is placed and the sample stand 4 is grounded. This surface treatment apparatus is used to charge the electret filter 3 for a predetermined time by vacuum plasma surface treatment to regenerate the same. Since the obtained electret filter is charged as a whole and has highly oriented electric polarization, excellent filter capacity the same as that at the time of initial production can be restored.


Inventors:
KURAUCHI TOSHIHARU
Application Number:
JP2002015847A
Publication Date:
July 29, 2003
Filing Date:
January 24, 2002
Export Citation:
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Assignee:
ULVAC CORP
International Classes:
B01D41/04; B01J19/08; B03C3/28; D06M10/00; (IPC1-7): B01D41/04; B01J19/08; B03C3/28; D06M10/00
Attorney, Agent or Firm:
Kinichi Kitamura (2 others)