Title:
流体投与装置の表面処理方法
Document Type and Number:
Japanese Patent JP2013533035
Kind Code:
A
Abstract:
A method of surface treating a fluid dispenser device, the method including a step of modifying at least one surface to be treated of at least a portion of the device by ionic implantation using multi-charged and multi-energy ion beams. The modified surface to be treated has anti-friction properties, the multi-charged ions are selected from helium (He), nitrogen (N), oxygen (O), neon (Ne), argon (Ar), krypton (Kr), and xenon (Xe), and ionic implantation is carried out to a depth of 0 mum to 3 mum.
Inventors:
Bruna Pascal
Busard duni
Genarek Frederick
Busard duni
Genarek Frederick
Application Number:
JP2013517466A
Publication Date:
August 22, 2013
Filing Date:
July 01, 2011
Export Citation:
Assignee:
Aptar France S.A.S.
International Classes:
A61M11/00; A61M15/00; C08J7/12
Domestic Patent References:
| JP2010526642A | 2010-08-05 | |||
| JP2007524760A | 2007-08-30 |
Foreign References:
| WO2008141141A2 | 2008-11-20 |
Attorney, Agent or Firm:
Naoko Mukai
Ueda public
Ueda public