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Title:
SURFACE TREATMENT METHOD, MANUFACTURING METHOD FOR LIQUID DROP EJECTION HEAD, LIQUID DROP EJECTION HEAD AND LIQUID DROP EJECTION APPARATUS
Document Type and Number:
Japanese Patent JP2007253124
Kind Code:
A
Abstract:

To provide a surface treatment method capable of easily and inexpensively giving an affinity and a liquid-repellent property relative to an adhesive to two different predetermined areas of a surface of a substrate, a manufacturing method for a liquid drop ejection head provided with the substrate applied with the treatment by the surface treatment method, a liquid drop ejection head manufactured by the manufacturing method, and a liquid drop ejection apparatus with a high reliability.

The surface treatment method of the present invention is a surface treatment method for giving the liquid-repellent property to a first area of the surface of the substrate and giving the affinity relative to the adhesive to a second area different from the first area, and is a surface treatment method having a step for preparing the substrate, and a step for bonding a first reactive group to the substrate by feeding a first compound having a first functional group having the liquid-repellent property and the first reactive group bonded to the substrate to the first area, and for bonding a second reactive group to the substrate by feeding a second compound having a second functional group having the affinity to the adhesive and the second reactive group bonded to the substrate to the second area.

COPYRIGHT: (C)2008,JPO&INPIT


Inventors:
MATSUO YASUHIDE
Application Number:
JP2006084084A
Publication Date:
October 04, 2007
Filing Date:
March 24, 2006
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
B05D5/00; B05D7/24; B41J2/16
Attorney, Agent or Firm:
Tatsuya Masuda
Kazuo Asahi