PURPOSE: To make possible the treatment in a static state as well as dust- proofing, improvement in efficiency and automation by injecting the required treating liquid into a space through the treating liquid injection hole of a chemical-resistant plate-shaped body so that the surface treatment is executed when the treating liquid in the space wets the substrate to be treated by surface tension.

CONSTITUTION: A developing stage in which an alkali soln. is used, an etching stage in which an aq. soln. of a sulfuric acid is used, a stripping stage in which an aq. soln. of caustic soda is used and finally a cleaning stage in which an soln. of a sulfuric acid is used are taken as an example for the stage for production and treatment in which the substrate 1 to be treated is photomask. The photomask which is the substrate 1 to be treated is held by a supporting mechanism 2 formed of 'Teflon(R)' and the respective treating liquids to be injected through a conduit pipe 5 are injected into the space between the chemical- resistant plate-shaped bodies 3 and 4 disposed to face each other on both sides of the photomask according to the procedure for the treatment stage. The treating liquid injected therein diffuses as the treating liquid 6 in the space so as to wet thoroughly the photomask 1 by the surface tension of the space.