Title:
SUSCEPTOR FOR VAPOR GROWTH
Document Type and Number:
Japanese Patent JP3923576
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide the susceptor by which a semiconductor is not contaminated and which has a long service life.
SOLUTION: This susceptor comprises a susceptor main body 2 which consists of a graphite base material and also, in which a countersunk concave part 4 having a side wall peripheral surface 7 perpendicular to a semiconductor wafer 3 to be received and placed on the susceptor is formed and further, the surface of which is coated with an SiC film 5 by a CVD(chemical vapor deposition) method. In the susceptor, a region ranging from an upper edge corner part 6 of the countersunk concave part 4 to the side wall peripheral surface 7 is subjected to beveling work.
Inventors:
Hiroyuki Hirano
Toshihiro Hosokawa
Okochi Michio
Masaki Okada
Toshihiro Hosokawa
Okochi Michio
Masaki Okada
Application Number:
JP33353696A
Publication Date:
June 06, 2007
Filing Date:
December 13, 1996
Export Citation:
Assignee:
Toyo Tanso Co., Ltd.
International Classes:
C30B25/12; C30B29/06; C30B35/00; H01L21/205; (IPC1-7): C30B25/12; C30B29/06; C30B35/00; H01L21/205
Domestic Patent References:
| JP2146165U | ||||
| JP8277193A | ||||
| JP5033526U | ||||
| JP7058029A | ||||
| JP56049518A | ||||
| JP7074114A |
Attorney, Agent or Firm:
Yoshiyuki Kaji
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