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Title:
SYSTEM FOR CONTROLLING FLUID, FLOWING THROUGH PROCESSING AREA
Document Type and Number:
Japanese Patent JP2003028480
Kind Code:
A
Abstract:

To provide a system for controlling the flow of air, passing through a processing room of a semi-conductor industry, a medical laboratory or a biological laboratory, in which a pressure is kept at a value lower than an atmospheric pressure to prevent the releasing of a microbe to the outside of the room, by controlling a local vacuum in the area such as a processing device or an exhausting hood.

The system for measuring the pressure of gas in the area comprises a buffer gas supplying means, a flow passage, through which the buffer gas flows from the supplying means to the processing area, and a pressure transforming device 54, provided so as to be neighbored to the flow passage to measure the pressure of the flow passage.


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Inventors:
PALMER DAVID W
Application Number:
JP2002119750A
Publication Date:
January 29, 2003
Filing Date:
October 22, 1993
Export Citation:
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Assignee:
PALMER DAVID W
International Classes:
F15B1/00; B01D53/26; B01L1/00; B08B15/02; F24F3/16; F24F7/06; F24F11/02; F24F11/75; F24F13/10; F24F13/12; F24F13/14; G05D7/01; G05D7/06; G05D16/10; G05D16/20; (IPC1-7): F24F11/02; F15B1/00; F24F7/06; F24F13/10
Attorney, Agent or Firm:
Yamazaki Yuzo



 
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