Title:
SYSTEM FOR FINDING DEFECT IN REPEATED PATTERN
Document Type and Number:
Japanese Patent JPS5587431
Kind Code:
A
Abstract:
PURPOSE:To simply and certainly find a defect in repeat patterns by taking a picture, by means of a photoline sensor, of electrode patterns on a display panel to be examined while moving the electrode patterns in a direction in which they continue, so as to obtain a signal correspond to the sum of picture elements in every repeat cycle, and then comparing this signal with a reference signal. CONSTITUTION:An electrode substrate 11 to be examined is placed on a longitudinally and transversely movable scan drive means 10, and a CCD photoline sensor 12 for taking a picture of electrode patterns is disposed above the electrode substrate 11. An A/D converter 15 for converting an analog image signal, which is input thereinto from the sensor 12, into a binary is provided, and an output of the A/D converter 15 is connected to a counter 17 through a section signal generator 16. A branch output of the converter 15 is connected to a data memory 20 through an address generator 19. In this structure, light is applied to the electrode substrate 11 so that high level signals and low-level signals are generated in the sensor 12 with respect to patterns A-X in space sections 4 between electrodes and electrode conductor sections 3, respectively. When a defect 6 exists, an abnormality signal is generated or the generation of an abnormality signal indicates the existence of a defect.
Inventors:
MORI TADATAMI
NAKAMURA MASAAKI
TOUFUKU ISAO
NAKAMURA MASAAKI
TOUFUKU ISAO
Application Number:
JP16250078A
Publication Date:
July 02, 1980
Filing Date:
December 26, 1978
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
G01B11/24; G01B11/30; G06K9/62; G06T1/00; H01L21/027; H01L21/30; H01L21/66; (IPC1-7): G01B11/24; G01B11/30; G06K9/62; H01L21/30