Title:
試験体の測定または分析のためのシステム
Document Type and Number:
Japanese Patent JP5785571
Kind Code:
B2
Abstract:
Various systems for measurement or analysis of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment (224). The purged environment (224) may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.
Inventors:
Fielden, John
Janic, Gary
Lee, Shin
Zao, Quian
Carac, Torsten
Yao, suntur
Tan, Zenkuang
Janic, Gary
Lee, Shin
Zao, Quian
Carac, Torsten
Yao, suntur
Tan, Zenkuang
Application Number:
JP2013021974A
Publication Date:
September 30, 2015
Filing Date:
February 07, 2013
Export Citation:
Assignee:
KLA-Tenker Corporation
International Classes:
H01L21/66; G01B11/06; G01J3/10; G01N21/21; G01N21/41; G01N21/55; G01J3/36; G01N21/33; G01N21/95
Domestic Patent References:
| JP2003130808A | ||||
| JP2003294436A | ||||
| JP2003163213A | ||||
| JP2003042722A | ||||
| JP8051078A |
Attorney, Agent or Firm:
Masaki Yamakawa
Shigeki Yamakawa
Shigeki Yamakawa