To provide the heavy ion implanting instrument of both a continuous hybrid type and a batch type using a magnetic scan system operated at a frequency from 20Hz to 300Hz condition.
A deflection apparatus for a high perveance ion beam, which works at a basic frequency of 20Hz or an order harmonic wave having a frequency higher than the basic frequency, and which has a magnetic structure formed by a stacked layer (72) having a thickness from 0.2 to 1mm. A compensator comprising a similar stacked layer structure having a resonance excitation circuit, which works at a frequency not less than 20 Hz, and which has a phase closure relation with a preliminary deflected beam frequency. A wide range of application for generating a strong magnetic field in a magnetic space is disclosed with another characteristics.
Katsuro Tanaka
Shinji Oga
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