Title:
SYSTEM, METHOD AND PROGRAM FOR SUBSTRATE SELECTION, AND COMPUTER-READABLE RECORDING MEDIUM
Document Type and Number:
Japanese Patent JP3956835
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate selection system, method, and program for obtaining a substrate having a desired resistivity after heat treatment, and also to provide a computer-readable recording medium.
SOLUTION: In the substrate selection system 10 when the upper and lower limit values for a requested resistivity are inputted into an inputting section 14, a detecting section 16 detects two post-heat-treatment resistivity values from the resistivity data 22 stored in a storing section 12. These two post-heat-treatment resistivity values are between the upper and the lower limit values. Then, based on the resistivity data 22, two resistivity values before a prescribed heat treatment is conducted (pre-heat-treatment resistivity values) are derived by a derivation section 18. In order to select a desired substrate, such a substrate as to have a resistivity between the two derived pre-heat-treatment resistivity values is selected by a user or by a computer.
Inventors:
Takashi Sakurada
Application Number:
JP2002327394A
Publication Date:
August 08, 2007
Filing Date:
November 11, 2002
Export Citation:
Assignee:
Sumitomo Electric Industries, Ltd.
International Classes:
H01L21/66; (IPC1-7): H01L21/66
Domestic Patent References:
| JP7050328A | ||||
| JP2000208524A | ||||
| JP1102932A |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Tatsuya Shioda
Shiro Terasaki
Masatoshi Shibata
Toyotaka Abe
Tatsuya Shioda
Shiro Terasaki
Masatoshi Shibata
Toyotaka Abe
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