Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SYSTEM FOR REGULATING PRESSURE IN VACUUM CHAMBER, AND VACUUM PUMPING UNIT EQUIPPED WITH THE SAME
Document Type and Number:
Japanese Patent JP2011008804
Kind Code:
A
Abstract:

To achieve a short reaction time by increasing the pressure adjustment range in a chamber containing effluents, connected by pipes to a pump unit including a dry mechanical primary pump and at least one secondary pump.

A system for regulating pressure in the chamber includes a speed regulator 6 controlling simultaneously the rotation speeds of the dry mechanical primary pump 4 and of the secondary pump 5.


More Like This:
JPH0771378ROTATING PISTON PUMP
JPH0725239[Name of invention] Lubrication structure of mechanical turbocharger
JPS58178895HORIZONTAL GEAR TYPE GREASE SEALING GAS COMPRESSOR
Inventors:
ROUSSEAU CLAUDE
PILOTTI PATRICK
MAQUIN PHILIPPE
Application Number:
JP2010178625A
Publication Date:
January 13, 2011
Filing Date:
August 09, 2010
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ALCATEL LUCENT
International Classes:
F04C18/18; F04B49/06; G05D16/20; F04C23/00; F04C25/02; F04C28/02; F04D27/02
Domestic Patent References:
JPH09317641A1997-12-09
JPH05240181A1993-09-17
JPS59142621A1984-08-15
Attorney, Agent or Firm:
Yoshio Kawaguchi



 
Previous Patent: ELECTRONIC COMMERCE COMMUNITY NETWORK AND INTRA/INTER COMMUNITY SECURE ROUTING IMPLEMENTATION

Next Patent: MAINTAINING PROCESSOR RESOURCE DURING ARCHITECTURAL EVENT