Title:
半導体装置の特性決定のためのシステムおよび方法
Document Type and Number:
Japanese Patent JP7447016
Kind Code:
B2
Abstract:
Second Harmonic Generation (SHG) can be used to interrogate a surface such as a surface of a layered semiconductor structure on a semiconductor wafer. In some instances, SHG is used to evaluate an interfacial region such as between metal and oxide. Various parameters such as input polarization, output polarization, and azimuthal angle of incident beam, may affect the SHG signal. Accordingly, such parameters are varied for different types of patterns on the wafer. SHG metrology on various test structures may also assist in characterizing a sample.
Inventors:
Ray, Min
Application Number:
JP2020560412A
Publication Date:
March 11, 2024
Filing Date:
April 26, 2019
Export Citation:
Assignee:
Femtometrics, Inc.
International Classes:
H01L21/66
Domestic Patent References:
| JP4340404A | ||||
| JP2012023238A | ||||
| JP2015046469A | ||||
| JP2005340632A | ||||
| JP2003209248A |
Foreign References:
| US20060044641 | ||||
| US20150330909 | ||||
| US5294289 |
Attorney, Agent or Firm:
Katsumi Iseki
Shuhei Kaneko
Wataru Ohnishi
Shuhei Kaneko
Wataru Ohnishi