Title:
Systems and methods for return beam metrology with optical switches
Document Type and Number:
Japanese Patent JP6342492
Kind Code:
B2
Abstract:
Extreme ultraviolet light (EUV) is produced in a laser-produced plasma (LPP) EUV light source when laser light strikes a target. Measuring reflected light from the target by a Return Beam Diagnostics (RBD) module provides data on EUV production, including but not limited to target position, target focus, target shape, and target profile. In a RBD module, a controller sequences an optical switch to direct the reflected light between a blocking element and a sensing device, providing greater flexibility in measuring the reflected light during different aspects of the EUV generation process, such as different power levels and duty cycles of the laser light striking the target.
Inventors:
Graham, Matthew Earl.
Bergstedt, Robert A.
Stephen, Chan
Bergstedt, Robert A.
Stephen, Chan
Application Number:
JP2016532756A
Publication Date:
June 13, 2018
Filing Date:
July 30, 2014
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F7/20; H05G2/00
Domestic Patent References:
| JP2010161364A | ||||
| JP2013012465A | ||||
| JP2010530614A |
Foreign References:
| WO2013063316A1 | ||||
| EP2009485A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki