Title:
有害な有機体を不活性化するための、プロセス流体を処理するシステム
Document Type and Number:
Japanese Patent JP7315255
Kind Code:
B2
Abstract:
System and method for treatment of a process fluid using ultraviolet light are provided. The system may have a wall, an inlet pipe and at least one length of brushes configured to brush a fluid along a side of the wall, generating a film on the fluid to be exposed to ultraviolet light as the fluid film flows along the wall. The system and method may further utilize at least one channel to provide fluid to the wall.
Inventors:
LeBaron, E. Shem
Application Number:
JP2021525398A
Publication Date:
July 26, 2023
Filing Date:
September 18, 2019
Export Citation:
Assignee:
Leveron IP Holdings, LLC
International Classes:
A61L2/10; B01J19/12
Domestic Patent References:
| JP2013523307A | ||||
| JP2018019670A | ||||
| JP2003520643A | ||||
| JP63182093A | ||||
| JP2005504634A |
Foreign References:
| US8541758 | ||||
| US9737862 | ||||
| KR200374175Y1 |
Attorney, Agent or Firm:
▲吉▼川 俊雄
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