Title:
印刷可能交互位相シフト・フィーチャを除去するためのフェムト秒レーザ融除によるテーパ付きイオン埋込み
Document Type and Number:
Japanese Patent JP4001785
Kind Code:
B2
Abstract:
The present invention provides various methods for eliminating printable alternating phase shift defects from an alternating phase shift mask without the need of using a trim mask. Specifically, unwanted printable defects are removed by employing methods which provide a gradual sloped region in the transparent or semi-transparent substrate which is formed in an area of the substrate opposite to that of the opaque image which is formed thereon.
Inventors:
Stephen Dee Flanders
Dennis M Haden
Timothy E Nearly
Dennis M Haden
Timothy E Nearly
Application Number:
JP2002184131A
Publication Date:
October 31, 2007
Filing Date:
June 25, 2002
Export Citation:
Assignee:
INTERNATIONAL BUSINESS MASCHINES CORPORATION
International Classes:
G03F1/30; G03F1/72; G03F7/20; H01L21/027
Domestic Patent References:
| JP5158215A | ||||
| JP6186728A |
Attorney, Agent or Firm:
Hiroshi Sakaguchi
Yoshihiro City
Takeshi Ueno
Yoshihiro City
Takeshi Ueno